About us

Founded in 2009, the company is headquartered in Futian District, Shenzhen. The company has R & D centers in Shenzhen and Osaka, Japan. Among them, Shenzhen Futian R & D center has gathered top talents in the industry at home and abroad, equipped with high-end precision instruments and equipment, an…

Etching solution ne-168

Etching solution ne-168

  • SUMII®︎

Etching solution NE-168, silicon wafer, IC substrate, and LED substrate can be selectively etched.


Characteristics:

1. Etching solution for etching nickel

2, silicon wafer, etchant used on IC substrate

3. Etchant for etching nickel without etching copper


Use:

Silicon wafer, IC substrate


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