About us

Founded in 2009, the company is headquartered in Futian District, Shenzhen. The company has R & D centers in Shenzhen and Osaka, Japan. Among them, Shenzhen Futian R & D center has gathered top talents in the industry at home and abroad, equipped with high-end precision instruments and equipment, an…

Etching solution MTE-001

Etching solution MTE-001

  • SUMII®︎

Etching etching solution for silicon wafer, IC substrate and LED substrate.


Characteristics:

1. Etching solution for etching nickel chromium

2. The most suitable removal of lamellae on flip chip (COF).

3. Etchant of non etched copper when etching nickel chromium layer


Use:

Overlying film (COF), passive device

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